Introduction of Aluminum Fluoride
Aluminum Fluoride
Molecular Formula:AlF3
UN Number:1759
Synonyms：aluminum fluoride,Aluminum trifluoride ,trifluoroalumane ,AlF3 ,Trifluoroaluminum
CAS Number:7784-18-1
Molecular Weight:83.97
General Description
Aluminum fluoride appears as odorless white powder or granules. Denser than water. Solubility in water at 25°C equals 0.559 g / 100 mL.
Aluminium trifluoride is an aluminium coordination entity.
ALUMINUM FLUORIDE FOR OPTICAL COATING
Fluoride compounds are used in coatings for the UV to middle-IR regions. They provide the lowest refractive indices and therefore are essential components of anti-reflective coatings. Fluoride films display absorption bands in the IR regions 2.8-3.2 µm and 6.0-7.4 µm to varying depths, depending on the compound and the deposition method and parameters. High substrate temperatures, E-beam and IAD are methods that reduce the depths of the absorptions.
Aluminum Fluoride, AlF3, is a well-known material which has previously been used as a coating material where a low index was required.* It is not affected by water and has good mechanical strength.
Why is AlF3 called aluminum fluoride?
Because its a simple inorganic substance, 'tri' is superfluous because we know the valency of aluminium is (almost always) 3+ and thus we know there will be three chloride anions without even having to look at its formula.
What is Aluminium fluoride used for?
Aluminium fluoride is an important additive for the production of aluminium by electrolysis. Together with cryolite, it lowers the melting point to below 1000 °C and increases the conductivity of the solution. It is into this molten salt that aluminium oxide is dissolved and then electrolyzed to give bulk Al metal.
How do you dissolve aluminum fluoride?
Hydrofluoric acid has long been known to be effective at dissolving aluminum fluoride. Unfortunately, hydrofluoric acid also strongly attacks the aluminum in the underlying aluminum, anodized aluminum, or sprayed ceramic surface. Hydrofluoric acid thus damages surfaces made from these materials.
AlF3 coatings have a very low index compared with other fluorides. A loss of ~2% in transmission at wavelengths near 400 nm is attributed to a partial deficiency of fluorine content caused by decomposition in the E-beam evaporation. This depletion is aggravated by high energy processes, such as ion assisted deposition (IAD). The effect is minimal with resistance heated evaporation. Since the test evaporated film layer was ~1500 nm thick, this deficiency would be undetectable in the UV, where applications require layers one-tenth this thickness. AlF3 has promise for IR use although its absorption in the 10 µm region might be a little higher than desirable for high energy applications. The durability and adhesion of AlF3 films proved to be excellent. In the UV, AlF3 is finding applications in high energy laser coatings at wavelengths below 250 nm.
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